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Application of uniform design to improve dental implant system

Issue title: Frontiers in Biomedical Engineering and Biotechnology – Proceedings of the 4th International Conference on Biomedical Engineering and Biotechnology, 18–21 August 2015, Shanghai, China

Guest editors: Feng Liu, Dong-Hoon Lee, Ricardo Lagoa and Sandeep Kumar

Article type: Research Article

Authors: Cheng, Yung-Changa; * | Lin, Deng-Hueia | Jiang, Cho-Peib

Affiliations: [a] Department of Mechanical and Automation Engineering, National Kaohsiung First University of Science and Technology, Taiwan | [b] Department of Power Mechanical Engineering, National Formosa University, Taiwan

Correspondence: [*] Address for correspondence: Yung-Chang Cheng, Department of Mechanical and Automation Engineering, National Kaohsiung First University of Science and Technology, Taiwan. Tel.: +886-7-6011000 ext. 2293; Fax: +886-7-6011066; E-mail: [email protected].

Keywords: Zimmer implant, dynamic loads, micromotion, uniform design

DOI: 10.3233/BME-151343

Journal: Bio-Medical Materials and Engineering, vol. 26, no. s1, pp. S533-S539, 2015

Published: 2015
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This paper introduces the application of uniform experimental design to improve dental implant systems subjected to dynamic loads. The dynamic micromotion of the Zimmer dental implant system is calculated and illustrated by explicit dynamic finite element analysis. Endogenous and exogenous factors influence the success rate of dental implant systems. Endogenous factors include: bone density, cortical bone thickness and osseointegration. Exogenous factors include: thread pitch, thread depth, diameter of implant neck and body size. A dental implant system with a crest module was selected to simulate micromotion distribution and stress behavior under dynamic loads using conventional and proposed methods. Finally, the design which caused minimum micromotion was chosen as the optimal design model. The micromotion of the improved model is 36.42 μm, with an improvement is 15.34% as compared to the original model.

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