Searching for just a few words should be enough to get started. If you need to make more complex queries, use the tips below to guide you.
Article type: Research Article
Authors: Paszyńska, Anna | Grabska, Ewa | Paszyński, Maciej
Affiliations: Faculty of Physics, Astronomy and Applied Computer Science, Jagiellonian University, Reymonta 4, 30-059, Krakow, Poland. [email protected]; [email protected] | AGH University of Science and Technology, Krakow, Poland. [email protected]
Note: [] Address for correspondence: AGH, University of Science and Technology, Al.Mickiewicza 30, 30-059, Kraków, Poland
Abstract: This paper presents a composite programmable graph grammar model of the three dimensional self-adaptive hp Finite Element Method (hp-FEM) algorithms. The computational mesh composed of hexahedral finite elements is represented by a composite graph. The operations performed over the mesh are expressed by composite graph grammar productions. The three dimensional model is based on the extension of the two dimensional model for rectangular finite elements. This paper is concluded with numerical examples, presenting the generation of the optimal mesh for simulation of the Step-and-Flash Imprint Lithography (SFIL), the modern patterning process.
Keywords: Graph grammar, Automatic hp adaptivity, Finite Element Method, Step-and-Flash Imprint Lithography
DOI: 10.3233/FI-2012-623
Journal: Fundamenta Informaticae, vol. 114, no. 2, pp. 183-201, 2012
IOS Press, Inc.
6751 Tepper Drive
Clifton, VA 20124
USA
Tel: +1 703 830 6300
Fax: +1 703 830 2300
[email protected]
For editorial issues, like the status of your submitted paper or proposals, write to [email protected]
IOS Press
Nieuwe Hemweg 6B
1013 BG Amsterdam
The Netherlands
Tel: +31 20 688 3355
Fax: +31 20 687 0091
[email protected]
For editorial issues, permissions, book requests, submissions and proceedings, contact the Amsterdam office [email protected]
Inspirees International (China Office)
Ciyunsi Beili 207(CapitaLand), Bld 1, 7-901
100025, Beijing
China
Free service line: 400 661 8717
Fax: +86 10 8446 7947
[email protected]
For editorial issues, like the status of your submitted paper or proposals, write to [email protected]
如果您在出版方面需要帮助或有任何建, 件至: [email protected]