X-Ray Sources Based on Subpicosecond-Laser-Produced Plasmas

Article type: Research Article

Authors: Kieffer, J. C. | Chaker, M.

Affiliations: INRS-Energie et Matériaux, C.P. 1020, 1650 Montéee Ste-Julie, Varennes, Québec, Canada J3X 1S2

Abstract: The production of an efficient user friendly ultrafast x-ray source requires an understanding of the role of the various factors which affect the x-ray emission. Here we examine several issues which control the source brightness and the pulse duration. Picosecond time-resolved, high spectral resolution spectroscopy is used to study plasmas produced by a subpicosecond laser pulse with intensity between 1016 W/cm2 and 5 × 1018 W/cm2.

DOI: 10.3233/XST-1994-4406

Journal: Journal of X-Ray Science and Technology, vol. 4, no. 4, pp. 312-322, 1994