Characterization of a Flat-Field Grazing-Incidence XUV Spectrometer

Article type: Research Article

Authors: Schwanda, W. | Eidmann, K. | Richardson, M. C.

Affiliations: Max-Planck-Institut für Quantenoptik, 85740 Garching, Germany | Center for Research in Electro-Optics and Lasers, 12424 Research Parkway, Orlando, Florida 32892

Abstract: We describe a XUV spectrometer for the study of dense hot microplasmas at wavelengths between ≈50 and ≈300 Å. It uses a commercially fabricated grazing incidence flat-field reflection grating with 1200 grooves per millimeter. The spectral resolution was optimized by imaging the source on a narrow slit with the help of a curved grazing incidence mirror. The instrument was tested with a laser-produced plasma as a source. The limit of the resolving power due to imaging aberrations of the flat-field grating ranges from 1500 at 50 Å to 3600 at 200 Å and has been achieved with a 5-μm slit. We also measured and calculated the grating efficiencies for the first to fifth diffraction order as a function of wavelength.

DOI: 10.3233/XST-1993-4102

Journal: Journal of X-Ray Science and Technology, vol. 4, no. 1, pp. 8-17, 1993