Optimum collimator for proximity X-ray lithography Theoretical analysis

Article type: Research Article

Authors: Artioukov, Igor A. | Kozhevnikov, Igor V. | Kozhevnikova, Nataliya I.

Affiliations: Lebedev Physical Institute, Leninsky prospect 53, Moscow 117924, Russia.

Note: [] Corresponding author: I.V. Kozhevnikov, Lebedev Physical Institute, Leninsky prospect 53, Moscow 117924, Russia. Fax: +7 095 1357880; E-mail: [email protected].

Abstract: The paper deals with the application of soft X-ray optics to the enhancement of the efficiency of X-ray proximity lithography based on a point X-ray source. The grazing incidence X-ray collimators are shown to increase the efficiency coefficient in several hundreds times. The design of the optimum X-ray collimator is proposed and analysed for the scheme of X-ray proximity lithography with spatial resolution 0.05 µm. The collimator transforms the divergent radiation of an X-ray point source into high collimated beam that illuminates uniformly the mask at normal incidence.

Journal: Journal of X-Ray Science and Technology, vol. 8, no. 3, pp. 199-220, 1998