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Article type: Research Article
Authors: Mutikainen, Risto | Viitanen, Veli-Pekka | Nenonen, Seppo
Affiliations: Technical Research Centre of Finland, Semiconductor Laboratory, Otakaari 7 B, FIN-02150 Espoo, Finland | Outokumpu Instruments Oy, Riihitontuntie 7 C, FIN-02200 Espoo, Finland
Abstract: A technology capable of producing large-area pressure-tolerant x-ray entrance windows of submicrometer thickness is presented. It is based on successive tungsten griddings to support a multilayered membrane consisting of polyimide, aluminum, and aluminum nitride. The aspects of design and fabrication processes are discussed with emphasis on the window foil fabrication. The performance of the windows is presented in terms of x-ray transmission, gas leak, pressure endurance, and radiation hardness properties.
DOI: 10.3233/XST-1994-4202
Journal: Journal of X-Ray Science and Technology, vol. 4, no. 2, pp. 82-95, 1994
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