A Soft X-Ray/EUV Reflectometer Based on a Laser Produced Plasma Source

Article type: Research Article

Authors: Gullikson, E. M. | Underwood, J. H. | Batson, P. C. | Nikitin, V.

Affiliations: Center for X-Ray Optics, Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, California 94720

Abstract: A soft x-ray reflectometer is described which is based on a laser-produced plasma source and is continuously tunable over the range 40 Å < λ < 400 Å. The source is produced by focusing 0.532-μm light from a Q-switched Nd:YAG laser on a solid target. The x-ray wavelength is defined using a high throughput spherical grating monochromator with moderate resolving power (λ/Δλ ≈ 100 to 500). A time-averaged monochromatized flux of more than 109 photons/s in a 1% bandwidth at 100 eV is obtained. Photon “shot noise” limited measurements are obtained by the use of an I0 detector to normalize out the shot-to-shot variations in source intensity. Measurements with submillimeter spot sizes are readily obtainable. Various detectors have been used and the advantages and disadvantages of each are discussed. The higher order contamination of the monochromator output has been analyzed using a second grating for the purpose of making measurement corrections. The reflectometer thus provides the capability for precision absolute measurements of the reflectance of gratings and multilayer mirrors, the transmittance of thin film filters, or other properties of x-ray optical elements.

DOI: 10.3233/XST-1992-3402

Journal: Journal of X-Ray Science and Technology, vol. 3, no. 4, pp. 283-299, 1992